| Title | Effects of capping HfO2 with multivalent oxides toward reducing the number of charged defects |
| Publication Type | Journal Article |
| Year of Publication | 2010 |
| Authors | Umezawa N |
| Journal | Appl. Phys. Lett. |
| Volume | 96 |
| Pagination | 162906 |
| Title | Effects of capping HfO2 with multivalent oxides toward reducing the number of charged defects |
| Publication Type | Journal Article |
| Year of Publication | 2010 |
| Authors | Umezawa N |
| Journal | Appl. Phys. Lett. |
| Volume | 96 |
| Pagination | 162906 |