| Title | Impact of carbon and nitrogen impurities in high-k dielectrics on metal-oxide-semiconductor devices |
| Publication Type | Journal Article |
| Year of Publication | 2013 |
| Authors | Choi M, Lyons JL, Janotti A, Van de Walle CG |
| Journal | Appl. Phys. Lett |
| Volume | 102 |
| Pagination | 142902 |
| DOI | 10.1063/1.4801497 |
Grant:
MRI R2 (CNS-0960316), MRL (DMR-1121053)